Analysis of Nine Nitrosamines Relevant to Occupational Safety by Ion
This study aims to analyse nine nitrosamines relevant in the field of occupational safety using a gas chromatography-drift tube ion mobility spectrometry (GC-DT-IMS) system.
This study aims to analyse nine nitrosamines relevant in the field of occupational safety using a gas chromatography-drift tube ion mobility spectrometry (GC-DT-IMS) system.
This study aims to develop, optimise, and evaluate a gas chromatography-drift tube-ion mobility spectrometry (GC-IMS) based method with a twofold enrichment strategy consisting of solid phase extraction (SPE) followed by in-tube extraction (ITEX) of the eluate for nine different nitrosamines in drinking water in order to offer a sensitive alternative to the current state of the art.
Using the Shimadzu Pesticide MRM Library and the Restek Raptor Biphenyl LC column, a single multiresidue LC-MS/MS method was developed for 646 pesticides.
For the uninitiated, analytical instrumentation can be a confusing mix of abbreviations and hyphenation. In this series of articles, we break down and explain in practical terms what instruments are appropriate for a particular analysis and what to consider when choosing an instrumental technique.
In this article, an example of comprehensive analysis of residual pesticides in spinach using a Revive In-Line Sample Preparation (ILSP) and the quadrupole time-of-flight mass spectrometer LCMS-9050 is introduced.
This work presents a new purification approach based on liquid chromatography fractionation on silica using the same column and eluents as for the usual MOSH/MOAH fractionation.
These general guidelines can help extend the shelf life of volatile reference standards, improving analyte recoveries and assisting accurate quantification.
This optimized LC-MS/MS method analyzes 282 pesticides and 8 mycotoxins in bee pollen.
Troubleshooting coeluting compounds during packed column gas analyses can be a difficult task. In this post, we look at the more common coeluting gas issues you may face and recommend steps to overcome them.
Delayed atomic layer deposition (ALD) of ZnO, i.e., area selective (AS)-ALD, was successfully achieved on silicon wafers (Si\SiO2) terminated with tris(dimethylamino)methylsilane (TDMAMS). This resist molecule was deposited in a home-built, near-atmospheric pressure, flow-through, gas-phase reactor.